US-based battery technology provider Charge CCCV (C4V) has on Monday announced the introduction of its Lithium slim energy reserve (LiSER) battery technology in India.
LiSER, the unique cell platform, brings a revolutionary cell technology to address the challenges, including supply chain, cost, and battery performance.
The cells’ solid structural design and low carbon footprint enhance the utility and environmental friendliness of the platform powering C4V’s pursuit of a cleaner, greener, and cost-effective energy storage future. It enables cell to chassis and cell to pack solution with improved performance metrics. Additionally, the technology includes safety characteristics due to C4V’s oxygen-deficient patented BMLMP technology, a statement from the company said.
Shailesh Upreti, CEO, C4V, said, “The technology not only allows our BMLMP chemistry to compete with cobalt & nickel based batteries at the pack level but also enables Giga scale production to be more sustainable with our breakthrough high-speed manufacturing processes. A leading cell to pack or cell to chassis design that can bridge the gap between energy density and power density in a very safe mechanism would allow us to cater to various market verticals with a single cell technology platform, and we are supercharged as our OEM partners start sharing their experiences with us”.
Kuldeep Gupta, Vice President (Strategic Partnership), C4V, said, 'The world today is reeling from a shortage of semiconductors to shockwaves in prices that are being felt across the automobile and consumer electronics industries due to raw material deficits. As Indian EV markets grow exponentially, C4V aims to solve similar trends across critical battery materials like cobalt and nickel very soon. Our goal is to make the country self-reliant in terms of EV generation in all respects. The automotive manufacturing sector in India is a major contributor to the GDP and we as an ancillary wholeheartedly support the mission of making the country EV superpower in the next five years.”